Oscilloscope (Rigol, DS 1074Z)

Specification

  • Display: 17.8 cm (7") WVGA-Color-LCD

  • Resolution: 800 X 480 Pixel

  • Channels: 4

  • Bandwidth: 70 MHz

  • Real-time sample rate: up to 1 GSa/s realtime

  • Memory: max. 12M Mpts (1 Channel)

  • Analog digital converter(A/D): 8bit

  • Sensitivity range: (V/div): 1 mV/div to 10 V/div

Function generator (Instek, gfg-8210)

Specification

  • Frequency Range: 0.1 Hz ~ 10 MHz frequency range

  • Amplitude: ≥10 Vpp (into 50Ω load)

  • Impedance: 50Ω±10%

  • Attenuator: -20 dB ±1 dB x 2

  • DC offset: <-5 V ~ >+5 V (into 50Ω load)

  • Duty control: 15% : 85% : 15% to 1MHz continually variable (square wave only)

  • Display: 6  digit LED display

  • Sweep mode: Lin/Log switch selectable

  • Resolution: Maximum resolution is 100nHz for 1Hz and 1Hz for 100MHz

Power amplifier (Labworks, pa-141)

Specification

  • Output Voltage: 50 V rms

  • Output current: 20 A rms

  • Max. cont. dissipation: 900 W

  • Frequency response: DC - 10 KHz-.6 dB & DC - 2 KHz-.2 dB @ 4 Ω

  • Input impedance: 10 KΩ

  • External interlock circuit: Ext. switch or TTL

Fluorescence microscope (Nikon, eclipse ts-100)

Specification

  • Optical System: CFI60 infinity system, parfocal distance 60 mm

  • Focusing: Vertical objective movement; Coarse stroke: 37.7 mm per rotation, Fine stroke: 0.2 mm per rotation

  • Illumination: High luminescent white LED illuminator (Eco-illumination)

  • Filter: 45 mm NCB11, ND8 and GIF (green interference)

  • Eyepiece lens: C-W 10x (F.O.V. 22 mm), C-W 15x (F.O.V. 16 mm)

  • Condenser (without condenser O.D. 190 mm): ELWD condenser: N.A. 0.3 (O.D. 75 mm)

  • Epi-fluorescence attachment: Field diaphragm, Fluorescence filter block holder (2 filter blocks mountable, 1 empty position), Heat absorbing filter, Lamphouse for 50W mercury lamp, Light shielding plate, UV-cut filter (detachable)

Atomic force microscope (Park, XE7)

Specification

  • XY Scan range (closed-loop control): 100 μm x 100 μm, 50 μm x 50 μm, 10 μm x 10 μm

  • XY travel range: 13 × 13 mm

  • Z travel range : 29.5 mm

  • Sample size : Up to 100 mm

  • Thickness : Up to 20 mm

  • High performance DSP : 600 MHz with 4800 MIPS

  • Maximum data size : 4096 × 4096 pixels

  • Power : 120 W

Electrodynamic Transducer (Labworks, ET-140)

Specification

  • Sine force: 110 lbf pk

  • Random force: 75 lbf rms

  • shock force: 225 lbf pk

  • Max displacement

    • Continuous pk-pk: 1.0 in​

    • Between stops: 1.03 in

  • Frequency range DC: ~ 6,500 Hz

  • Maximum velocity: 70 ips pk

Plasma system (Femto science, CUTE)

Specification

  • Chamber: W. 140 x D. 200 x H. 110 (mm)

  • Generator: 100 W, 20 ~ 100 KHz

  • Controller: Auto & manual control by 7'' touch PC

  • Geometry: W. 580 x D. 580 x H. 340 (mm)

  • Option: Quartz chamber (Dia. 100 x L. 200 mm) RIE mode. dual mode

Reactive Ion Etching machine (Femto science, VITA)

Specification

  • Electrode: 9.2 inch

  • Generator: 3000 W, RF. 13.56 MHz

  • Gas line: Up to 6 x Channel

  • Controller: Auto & Manual control by 7'' touch PC

  • Geometry: W. 680 x D. 1100 x H. 1300 (mm)

Smart drop (Femtofab, smart drop)

Specification

  • Measuring range : 1˚~178˚

  • Accuracy : ± 0.1

  • Measurable size : <50μL

  • Hysteresis measurement : Tilting/Captive method

  • Gravitational distortion of drop shape is perfectly tracked by GEM numerical solver

  • Measuring range : 0~8㎜

  • Camera resolution : 640 x 480 (1288 x 964 at 30 fps)

Injection mold machine (Sumitomo, se50d)

Specification

  • Screw diameter: 25 mm

  • Injection Capacity: 51 cm3

  • Mold space: 160 - 350 mm

  • Clamping force :50-Ton

  • Distance between tie bar: 360 x 310 mm

  • Distance between tie bar: 360 x 310 mm

  • Ejector force: 2.2 tonf

Gift engraving machine (Rolanddgi, EGX-360)

Specification

  • Workpiece table size: Width x depth: 305 × 230 mm (12 × 9.1 in.)

  • Loadable workpiece weight: 4.3 kg (including the weight of jig)

  • X, Y, and Z operation strokes: X, Y, and Z: 305 × 230 × 40 mm (12 × 9.1 × 1.6 in.)

  • Maximum angle of rotation: ±18×105° (±5000 rotations) During engraving: ±360°

  • Software resolution: 0.01 mm/step or 0.025 mm/step (0.0004in./step or 0.001in./step)

  • Operating speed: 

    • X and Y axis: 0.1 to 60 mm/sec. (0.004 to 2.4 in./sec)​

    • Z axis: 0.1 to 30 mm/sec. (0.004 to 1.2 in./sec)

Electrospinning machine (NanoNC, ES-robot)

Specification

  • H.V generator: 30 kV/60 kV(option)

  • 1-axis robot: ball screw, servo motor, 160mm/s 

  • Working distance (max): 200mm/300mm/400mm(option)

  • Syringe pump: min 0.01㎕/min

  • Drum collector: 5~2,800rpm, servo motor

  • Spinning direction angle control:0~90°

  • No tubing: minimum dead volume

Laser cutter (Machine shop, ML-7050A)

Specification

  • Laser: CO2 Laser glass tube

  • Working area: 500 mm x 700 mm

  • Lifting area: 0 - 200 mm

  • Cutting speed: 0-68000 mm/m

  • Min. engraving size: 1 mm x 1 mm

  • Location accuracy: 0.01 mm

  • Working Voltage: AC110-220V, 50-60 Hz

  • Controller: Ruida

 

 

77, Cheongam-ro, Nam-gu, Pohang-si, Gyeongsangbuk-do, 37673, Rep. of Korea

TEL: +82-54-279-2843

FAX: +82-54-279-5912

 

 

Materials processing & Integrated Biosystems Laboratory                                                             

Department of Mechanical Engineering, Pohang University of Science and Technology